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Industrial Research And Consultancy Centre

A Semiautomated Tool for Fabrication of Vacuum based Optoelectronic Devices: Cluster Tool

 

This technology addresses the critical need for a contamination-free environment during fabrication, which is essential for producing high-quality multi-layer thin-film optoelectronic devices. It has a multi-chamber configuration, each dedicated to specific deposition processes, eliminating cross-contamination and ensuring precise layer deposition. The system's unique design, including features like magnetic transfer arms and pneumatic gate valves, facilitates the smooth transfer of samples between chambers without exposing them to ambient conditions. Its ability to enhance the efficiency and quality of optoelectronic device fabrication potentially leads to advancements in various fields, such as photovoltaics, OLEDs, and other electronic applications.

 

In the fabrication of optoelectronic devices, maintaining a contamination-free environment is crucial. Conventional glove box systems often suffer from cross-contamination, large amounts of material decomposition, limited flexibility, and require significant space due to their single-chamber design. Additionally, these systems are not optimized for the simultaneous deposition of multiple layers, which can compromise the quality and performance of the final device. It solves these issues by providing a multi-chamber system that prevents cross-contamination and optimizes the deposition process.

 
  • Cross-Contamination Prevention: The multi-chamber design and use of pneumatic gate valves effectively eliminate the risk of cross-contamination, which is a common issue in conventional systems. 
  • Enhanced Efficiency: Multiple effusion cells and precise control mechanisms allow for efficient material deposition, reducing waste and improving device quality. 
  • Flexibility and Scalability: The system's design can be customized and scaled according to specific requirements, making it versatile for various applications. 
  • Space Optimization: Unlike traditional systems that require large glove boxes, this system can operate with a smaller footprint, optimizing laboratory space. 
  • Enhanced performance and reproducibility: High-quality multi-layer thin-film optoelectronic devices with uniform layers improves device performance and reproducibility.
 
  • Multi-Chamber Design for Layer Deposition: Utilizes a multi-chamber design, with each chamber dedicated to depositing a specific layer of the optoelectronic device. 
  • Central Transfer Chamber: Central transfer chamber facilitates the movement of samples between deposition chambers without breaking vacuum. 
  • Magnetic Transfer Arms: The system utilizes magnetic transfer arms to move substrates between chambers, further minimizing the risk of contamination and maintaining a high vacuum. 
  • Optimized multiple effusion cell design: The effusion cells are designed with an inclination of 20 degrees from vertical to minimize material loss during deposition and ensure efficient material usage. 
  • Real-Time Thickness Monitoring with QCMs: Real-time thickness monitoring system using quartz crystal microbalances (QCMs) ensuring uniformity and desired layer thickness.
 

The system includes multiple chambers dedicated to depositing specific layers, such as organic layers (hole transport, emissive, electron transport) and top electrodes (metals, metal oxides, halides, or carbonates). A central transfer chamber allows sample movement between deposition chambers using magnetic transfer arms without breaking vacuum. Each chamber is equipped with effusion cells for material evaporation, with shutters to control deposition and quartz crystal monitors to measure deposition rates. Pneumatic gate valves isolate chambers and a turbomolecular pump, backed by a rotary vane pump, maintains a high vacuum of approximately 10^-6 mbar. The system utilizes a proportional-integral-derivative (PID) controller to regulate the temperature and stability of material evaporation rates, achieving precise layer thickness control down to 0.01 A/s. It enables the fabrication of high-quality optoelectronic devices with uniform layer thickness and minimal contamination.

 

The technology’s portability and modular design makes it adaptable for various research and production settings. This accessibility could potentially drive innovation and accelerate the development of next-generation optoelectronic devices across diverse fields. This has significant implications for applications like displays, lighting, and sensing, contributing to advancements in areas such as energy efficiency, flexible electronics, and healthcare monitoring.

 

This technology is directly applicable to the electronics manufacturing industry, specifically for producing devices such as organic light-emitting diodes (OLEDs) and other thin-film transistors. Other sectors include solar energy for fabricating thin-film solar cells, optical coatings for producing precise optical filters or mirrors, and sensors for developing sensitive thin-film-based sensing elements.

Faculty
Prof. Dinesh Kabra
Department
Physics
Application Number
202221055348
Grant Number
464062
Date of filing
Date of grant
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Technology readiness level
9