Method of Fabrication Inverted Pyramid on Crystalline Silicon using Lithography Free Fabrication Technique

The present invention proposes a method of lithography free inverted pyramid fabrication in silicon. The photolithography step required in conventional process for the fabrication of inverted pyramidal texturing in silicon has been eliminated.The entire lithography process is replaced by means of a thin film deposition process and an annealing step.

Faculty Associated


  • Anil Kottantharayil, Sandeep S S

Patent Application no.