Laser doping tool
Tha laser doping tool is used for deep diffusion of phosphorus into silicon (from pre-deposited source) and SiNc ablation for contact patterning.
Make and Model
Scantech Laser Pvt. Ltd
Laser Wavelength 1070 + 10nm Beam mode TEM 00 Pulse mode CW and Modulated (1-1000kHz) Power output 2.5W-25W Minimum pulse <10μs Movement(translation) along X,Y and Z Maximum voltage of application Raster scanning along X and Y Mininum line to line translation
Mininum scan speed